Research & Development

Industry-Government-Academia Joint Research

The "Cooperation for Innovative Technology and Advanced Research in Evolutional Area (CITY AREA)" Program (Advanced Type)

For three years from 2007 to 2009, seven test and research institutes, including universities, and eight participant companies formed a cluster in the northern area of Wakayama Prefecture in the support project "Cooperation for Innovative Technology and Advanced Research in Evolutional Area (CITY AREA)" Program (Advanced Type) of the Ministry of Education, Culture, Sports, Science and Technology (MEXT) and are working on the industry-government-academia joint research and development.
With the project, under the subject "Development of Functional Organic Materials by Using Sustainable Resources/Technologies," three subjects are studied. We are developing high value-added functional materials used for semiconductor devices, etc., jointly with the three institutes, including Department of Nano Science, Faculty of Systems Engineering, Wakayama University; Japan Advanced Institute of Science and Technology; and Muroran Institute of Technology for the Subject 2 "Development of Organic/Inorganic Hybrid Materials Containing Silicon."

Research Outcome of the Project (Patent Applied)

Outcome of Research with Wakayama University

Japanese Patent Disclosure No. JPA2009-167336
Polysilsesquioxane Fine Particles Containing Halogeno Group and the Manufacturing Method
Japanese Patent Application Disclosure No. JPA2009-123789
Copolymer of Polysilsesquioxane Containing Methacryloxy Group or Acryloxy Group and Membrane Obtained by the Manufacturing Method and Polymerization Thereof

Outcome of Research with Japan Advanced Institute of Science and Technology

Japanese Patent Disclosure No. JPA2009-263316
Manufacturing Method of Incomplete Origosilsesquioxane
Japanese Patent Disclosure No. JPA2009-263596
Incomplete Origosilsesquioxane and Manufacturing Method Thereof
Japanese Patent Disclosure No. JPA2008-297908
Stereoisomeric Form of Incomplete Origosilsesquioxane, Polymers Using the Stereoisomeric Form and Manufacturing Method Thereof
Japanese Patent Disclosure No. JPA2009-255943
Complete Origosilsesquioxane and Manufacturing Method Thereof

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